It is demonstrated that the evolution of the surface relief of the stressed elastic nanolayer that interacts with mobile point defects can be described using a nonlinear equation similar to the Kuramoto–Sivashinsky equation. The solution to the equation describes the threshold (with respect to the defect concentration or the mechanical stress) transition to the periodic spatially bent state of the layer with the simultaneous generation of spatially periodic defect clusters at the extrema of the spontaneously emerging surface relief. In this case, the layer deformation corresponds to the displacements in the static bending Lamb wave. The self-organizing periodic cellular deformation–defect surface structure can serve as a universal seed for the subsequent growth of nanoparticles in the processes of laser, ion, or electrochemical etching and in molecular beam epitaxy of nanostructures.
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